Leading products in optical metrology Made in Germany

Mask Defect Inspection

MueTec provides in addition to the worldwide well established optical CD (Critical Dimension) mask metrology a cost effective and fast mask defect inspection method to capture statistical defects. Our systems are used in wafer manufacturing, photomask manufacturing, MEMS and LED manufacturing and in research institutes. 

 

SIGNIFICANT ADVANTAGES

  • Cost effective solution for statistical defecs
  • VIS capability
  • Reflected and transmitted light
  • High quality objectives
  • Flexible tool configurations available (manual to fully automized mask handling)
  • Bare mask and pellicle inspection
  • Universal use, in addition to inspection also CD-metrology

 

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Spector M
Semi Automatic

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Spector A
Automatic with mask robot and mask carriers

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Spector 8000
Automatic and fully enclosed with FFU

Contact

MueTec Europe

Headquarter

+49 89 1500 169 0

info@muetec.com

Hans-Bunte-Str. 5
80992 Munich / Germany

 

 

Manufacturing

+49 9938 9191-0

info@muetec.com

Isarauer Str. 77
94527 Aholming / Germany