Leading products in optical metrology Made in Germany

Metrology & Inspection

MueTec provides a comprehensive range of automated optical inspection (AOI) systems for various applications in the wafer and photomask industry, including CD (Critical Dimension) and Overlay Metrology, Defect Inspection, Defect Review and Film Thickness Measurement. These defect inspection and metrology equipment solutions are designed to support fabs expedite their development and production ramp cycles, to achieve higher semiconductor die yields and to improve return on invest. 

Our products are also used in related industries, including wafer manufacturing, photomask manufacturing, MEMS and LED manufacturing and general materials research. Our portfolio ranges from stand-alone microscopes and semi-automated systems all the way to fully-automated products and systems. We support wafer sizes from 50.8 mm to 300 mm and mask sizes up to 750 mm.  We invite you to visit sections of our website specific to your company’s metrology and inspection needs.

 

Products for Metrology & Inspection

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Spector-A
Fully automated mask metrology and inspection system

Typical Applications

CD
Defect Inspection


Features

Mask sizes up to 8“ by 8“

Robot handling

SECS/GEM

VIS, UV

Also available as semi-automated system with manual mask loading (Spector-M)

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MT8300
300mm metrology and inspection system (FOUP/SMIF)

Typical Applications

CD
Overlay
Film Thickness
Defect Inspection
Defect Review
300mm and 200mm wafer sizes
SECS/GEM
VIS, UV 

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MT3000
Fully automated metrology and inspection system (open cassette)

Typical Applications

CD
Overlay
Film Thickness
Defect Inspection
Defect Review


Features

VIS, UV

Simultaneous wafer handling 75 - 200mm

SECS/GEM

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MT2010
Fully automated metrology and inspection system (open cassette)

The MT2010 is designed for high precision defect inspection and metrology tasks on masks up to 6”. The system uses different illumination sources in transmitted and reflected light such as visible, I-line (365nm) and DUV (248nm).

MT2010 comes with laser autofocus and an anti-vibration isolating base frame with light tower.

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MT5500 / MT7500
Large area metrology and inspection system

Features

CD > 0,3 micron

contact holes > 0,3 micron

chrome and phase shift

resist on chrome

line edge roughness

substrate size up to 550mm x 550mm

DUV, 248nm; UV 365nm

DUV, UV, VIS

reflected and transmitted light

 

Substrates

large area scales

plastic electronics

glass scales

special customized solutions

Individual Inquiry

Contact

MueTec Europe

Headquarter

+49 89 1500 169 0

info@muetec.com

Hans-Bunte-Str. 5
80992 Munich / Germany

 

 

Manufacturing

+49 9938 9191-0

info@muetec.com

Isarauer Str. 77
94527 Aholming / Germany